http://scholar.google.com/citations?hl=en&user=95SvbM8AAAAJ
1.
Andrei V Alaferdov Victor A Ermakov, Alfredo R Vaz
Burning Graphene Layer-by-Layer Journal Article
Em: Nature Scientific Reports, vol. 5, pp. 11546, 2015.
@article{Ermakov2015,
title = {Burning Graphene Layer-by-Layer},
author = {Victor A Ermakov, Andrei V Alaferdov, Alfredo R Vaz, Eric Perim, Pedro AS Autreto, Ricardo Paupitz, Douglas S Galvao, Stanislav A Moshkalev},
url = {http://www.nature.com/articles/srep11546?WT.ec_id=SREP-639-20150630},
doi = {10.1038/srep11546},
year = {2015},
date = {2015-06-23},
journal = {Nature Scientific Reports},
volume = {5},
pages = {11546},
abstract = {Graphene, in single layer or multi-layer forms, holds great promise for future electronics and high-temperature applications. Resistance to oxidation, an important property for high-temperature applications, has not yet been extensively investigated. Controlled thinning of multi-layer graphene (MLG), e.g., by plasma or laser processing is another challenge, since the existing methods produce non-uniform thinning or introduce undesirable defects in the basal plane. We report here that heating to extremely high temperatures (exceeding 2000 K) and controllable layer-by-layer burning (thinning) can be achieved by low-power laser processing of suspended high-quality MLG in air in “cold-wall” reactor configuration. In contrast, localized laser heating of supported samples results in non-uniform graphene burning at much higher rates. Fully atomistic molecular dynamics simulations were also performed to reveal details of oxidation mechanisms leading to uniform layer-by-layer graphene gasification. The extraordinary resistance of MLG to oxidation paves the way to novel high-temperature applications as continuum light source or scaffolding material.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
Graphene, in single layer or multi-layer forms, holds great promise for future electronics and high-temperature applications. Resistance to oxidation, an important property for high-temperature applications, has not yet been extensively investigated. Controlled thinning of multi-layer graphene (MLG), e.g., by plasma or laser processing is another challenge, since the existing methods produce non-uniform thinning or introduce undesirable defects in the basal plane. We report here that heating to extremely high temperatures (exceeding 2000 K) and controllable layer-by-layer burning (thinning) can be achieved by low-power laser processing of suspended high-quality MLG in air in “cold-wall” reactor configuration. In contrast, localized laser heating of supported samples results in non-uniform graphene burning at much higher rates. Fully atomistic molecular dynamics simulations were also performed to reveal details of oxidation mechanisms leading to uniform layer-by-layer graphene gasification. The extraordinary resistance of MLG to oxidation paves the way to novel high-temperature applications as continuum light source or scaffolding material.
2015
1.
Andrei V Alaferdov Victor A Ermakov, Alfredo R Vaz
Burning Graphene Layer-by-Layer Journal Article
Em: Nature Scientific Reports, vol. 5, pp. 11546, 2015.
Resumo | Links | BibTeX | Tags: Burning, Graphene, Molecular Dynamics, TEM
@article{Ermakov2015,
title = {Burning Graphene Layer-by-Layer},
author = {Victor A Ermakov, Andrei V Alaferdov, Alfredo R Vaz, Eric Perim, Pedro AS Autreto, Ricardo Paupitz, Douglas S Galvao, Stanislav A Moshkalev},
url = {http://www.nature.com/articles/srep11546?WT.ec_id=SREP-639-20150630},
doi = {10.1038/srep11546},
year = {2015},
date = {2015-06-23},
journal = {Nature Scientific Reports},
volume = {5},
pages = {11546},
abstract = {Graphene, in single layer or multi-layer forms, holds great promise for future electronics and high-temperature applications. Resistance to oxidation, an important property for high-temperature applications, has not yet been extensively investigated. Controlled thinning of multi-layer graphene (MLG), e.g., by plasma or laser processing is another challenge, since the existing methods produce non-uniform thinning or introduce undesirable defects in the basal plane. We report here that heating to extremely high temperatures (exceeding 2000 K) and controllable layer-by-layer burning (thinning) can be achieved by low-power laser processing of suspended high-quality MLG in air in “cold-wall” reactor configuration. In contrast, localized laser heating of supported samples results in non-uniform graphene burning at much higher rates. Fully atomistic molecular dynamics simulations were also performed to reveal details of oxidation mechanisms leading to uniform layer-by-layer graphene gasification. The extraordinary resistance of MLG to oxidation paves the way to novel high-temperature applications as continuum light source or scaffolding material.},
keywords = {Burning, Graphene, Molecular Dynamics, TEM},
pubstate = {published},
tppubtype = {article}
}
Graphene, in single layer or multi-layer forms, holds great promise for future electronics and high-temperature applications. Resistance to oxidation, an important property for high-temperature applications, has not yet been extensively investigated. Controlled thinning of multi-layer graphene (MLG), e.g., by plasma or laser processing is another challenge, since the existing methods produce non-uniform thinning or introduce undesirable defects in the basal plane. We report here that heating to extremely high temperatures (exceeding 2000 K) and controllable layer-by-layer burning (thinning) can be achieved by low-power laser processing of suspended high-quality MLG in air in “cold-wall” reactor configuration. In contrast, localized laser heating of supported samples results in non-uniform graphene burning at much higher rates. Fully atomistic molecular dynamics simulations were also performed to reveal details of oxidation mechanisms leading to uniform layer-by-layer graphene gasification. The extraordinary resistance of MLG to oxidation paves the way to novel high-temperature applications as continuum light source or scaffolding material.
