http://scholar.google.com/citations?hl=en&user=95SvbM8AAAAJ
1.
Yongji Gong Bo Li, Zhili Hu
Solid–Vapor Reaction Growth of Transition‐Metal Dichalcogenide Monolayers Journal Article
Em: Angewandte Chemie, vol. 128, não 36, pp. 10814-10819, 2016.
@article{Li2016,
title = {Solid–Vapor Reaction Growth of Transition‐Metal Dichalcogenide Monolayers},
author = {Bo Li, Yongji Gong, Zhili Hu, Gustavo Brunetto, Yingchao Yang, Gonglan Ye, Zhuhua Zhang, Sidong Lei, Zehua Jin, Elisabeth Bianco, Xiang Zhang, Weipeng Wang, Jun Lou, Douglas S Galvão, Ming Tang, Boris I Yakobson, Robert Vajtai, Pulickel M Ajayan},
url = {onlinelibrary.wiley.com/doi/10.1002/anie.201604445/abstract},
doi = {10.1002/ange.201604445},
year = {2016},
date = {2016-08-26},
journal = {Angewandte Chemie},
volume = {128},
number = {36},
pages = {10814-10819},
abstract = {Two-dimensional (2D) layered semiconducting transition-metal dichalcogenides (TMDCs) are promising candidates for next-generation ultrathin, flexible, and transparent electronics. Chemical vapor deposition (CVD) is a promising method for their controllable, scalable synthesis but the growth mechanism is poorly understood. Herein, we present systematic studies to understand the CVD growth mechanism of monolayer MoSe2, showing reaction pathways for growth from solid and vapor precursors. Examination of metastable nanoparticles deposited on the substrate during growth shows intermediate growth stages and conversion of non-stoichiometric nanoparticles into stoichiometric 2D MoSe2 monolayers. The growth steps involve the evaporation and reduction of MoO3 solid precursors to sub-oxides and stepwise reactions with Se vapor to finally form MoSe2. The experimental results and proposed model were corroborated by ab initio Car–Parrinello molecular dynamics studies.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
Two-dimensional (2D) layered semiconducting transition-metal dichalcogenides (TMDCs) are promising candidates for next-generation ultrathin, flexible, and transparent electronics. Chemical vapor deposition (CVD) is a promising method for their controllable, scalable synthesis but the growth mechanism is poorly understood. Herein, we present systematic studies to understand the CVD growth mechanism of monolayer MoSe2, showing reaction pathways for growth from solid and vapor precursors. Examination of metastable nanoparticles deposited on the substrate during growth shows intermediate growth stages and conversion of non-stoichiometric nanoparticles into stoichiometric 2D MoSe2 monolayers. The growth steps involve the evaporation and reduction of MoO3 solid precursors to sub-oxides and stepwise reactions with Se vapor to finally form MoSe2. The experimental results and proposed model were corroborated by ab initio Car–Parrinello molecular dynamics studies.
2016
1.
Yongji Gong Bo Li, Zhili Hu
Solid–Vapor Reaction Growth of Transition‐Metal Dichalcogenide Monolayers Journal Article
Em: Angewandte Chemie, vol. 128, não 36, pp. 10814-10819, 2016.
Resumo | Links | BibTeX | Tags: Chalcogenides, cvd, DFT
@article{Li2016,
title = {Solid–Vapor Reaction Growth of Transition‐Metal Dichalcogenide Monolayers},
author = {Bo Li, Yongji Gong, Zhili Hu, Gustavo Brunetto, Yingchao Yang, Gonglan Ye, Zhuhua Zhang, Sidong Lei, Zehua Jin, Elisabeth Bianco, Xiang Zhang, Weipeng Wang, Jun Lou, Douglas S Galvão, Ming Tang, Boris I Yakobson, Robert Vajtai, Pulickel M Ajayan},
url = {onlinelibrary.wiley.com/doi/10.1002/anie.201604445/abstract},
doi = {10.1002/ange.201604445},
year = {2016},
date = {2016-08-26},
journal = {Angewandte Chemie},
volume = {128},
number = {36},
pages = {10814-10819},
abstract = {Two-dimensional (2D) layered semiconducting transition-metal dichalcogenides (TMDCs) are promising candidates for next-generation ultrathin, flexible, and transparent electronics. Chemical vapor deposition (CVD) is a promising method for their controllable, scalable synthesis but the growth mechanism is poorly understood. Herein, we present systematic studies to understand the CVD growth mechanism of monolayer MoSe2, showing reaction pathways for growth from solid and vapor precursors. Examination of metastable nanoparticles deposited on the substrate during growth shows intermediate growth stages and conversion of non-stoichiometric nanoparticles into stoichiometric 2D MoSe2 monolayers. The growth steps involve the evaporation and reduction of MoO3 solid precursors to sub-oxides and stepwise reactions with Se vapor to finally form MoSe2. The experimental results and proposed model were corroborated by ab initio Car–Parrinello molecular dynamics studies.},
keywords = {Chalcogenides, cvd, DFT},
pubstate = {published},
tppubtype = {article}
}
Two-dimensional (2D) layered semiconducting transition-metal dichalcogenides (TMDCs) are promising candidates for next-generation ultrathin, flexible, and transparent electronics. Chemical vapor deposition (CVD) is a promising method for their controllable, scalable synthesis but the growth mechanism is poorly understood. Herein, we present systematic studies to understand the CVD growth mechanism of monolayer MoSe2, showing reaction pathways for growth from solid and vapor precursors. Examination of metastable nanoparticles deposited on the substrate during growth shows intermediate growth stages and conversion of non-stoichiometric nanoparticles into stoichiometric 2D MoSe2 monolayers. The growth steps involve the evaporation and reduction of MoO3 solid precursors to sub-oxides and stepwise reactions with Se vapor to finally form MoSe2. The experimental results and proposed model were corroborated by ab initio Car–Parrinello molecular dynamics studies.
